RIE
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What is RIE?
RIE typically refers to Reactive Ion Etching. It's a microfabrication technique used to selectively remove material from a surface using chemically reactive plasma. It's commonly used in semiconductor manufacturing to create patterns on wafers by etching away material that isn't protected by a mask.
What other technologies are related to RIE?
RIE Competitor Technologies
PECVD
PECVD is another plasma-based deposition technique that can be used to deposit thin films. It can be a competitor because it's an alternative method for achieving similar results to RIE in certain applications, especially deposition.
dry etch
Dry etching is a broader category that encompasses RIE. Other dry etching techniques such as deep RIE and isotropic etching compete with RIE for etching applications.
CVD
Chemical Vapor Deposition is a thin film deposition technique. CVD can be an alternative to etching in some applications where material removal is achieved through deposition of a masking layer instead of direct etching.
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RIE Complementary Technologies
photolithography
Photolithography is used to pattern the surface before RIE. RIE then etches away the unprotected areas of the surface, making it a crucial step in microfabrication sequences.
ALD
Atomic Layer Deposition is a thin film deposition technique. ALD can be used to deposit hardmasks for RIE or to deposit films after RIE.
ICP
Inductively Coupled Plasma is a type of plasma source that can be used in RIE systems to generate high-density plasmas, enhancing the etch rate and anisotropy. Therefore, ICP is often used to enhance RIE performance.
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Which job functions commonly mention RIE?
Integration Engineer
10 Integration Engineer jobs mention RIE
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jobs on Sumble
Chip Designer
15 Chip Designer jobs mention RIE
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jobs on Sumble
Hardware Engineer
18 Hardware Engineer jobs mention RIE
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jobs on Sumble
Business Systems
23 Business Systems jobs mention RIE
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jobs on Sumble
Engineer
307 Engineer jobs mention RIE
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jobs on Sumble
Which organizations are mentioning RIE?
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