CVD
What is CVD?
Chemical Vapor Deposition (CVD) is a process used to produce high-quality, high-performance solid materials. In CVD, a substrate is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired thin film or coating. CVD is widely used in the semiconductor industry to deposit various materials like silicon, silicon dioxide, silicon nitride, and metal films, and also in other fields like manufacturing wear-resistant coatings.
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