dry etch Insights

What is dry etch?

Dry etching, also known as plasma etching, is a microfabrication process used to remove material from a silicon wafer or other substrate using reactive gases or plasmas. It is commonly used in the semiconductor industry to create intricate patterns on integrated circuits. Unlike wet etching, dry etching is anisotropic, allowing for highly precise and directional material removal, enabling the fabrication of high-density and complex microstructures.

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What other technologies are related to dry etch?

dry etch Competitor Technologies

wet etch

Wet etching is an alternative etching method that uses liquid chemicals to remove material. It is a direct competitor to dry etch.

mentioned alongside dry etch in 57% (352) of relevant job posts

dry etch Complementary Technologies

implant

Ion implantation is used to dope semiconductors, modifying their electrical properties. It is often used in conjunction with etching processes to create specific device structures.

mentioned alongside dry etch in 46% (165) of relevant job posts

thin films

Thin films are materials deposited on a substrate. Etching, including dry etching, is often used to pattern and define features in thin films.

mentioned alongside dry etch in 46% (157) of relevant job posts

Diffusion

Diffusion is a process used to introduce dopants into a semiconductor material. It's complementary to etching, which helps define the areas where diffusion occurs or removes unwanted diffused material.

mentioned alongside dry etch in 20% (209) of relevant job posts