What is dry etch?

Dry etching, also known as plasma etching, is a microfabrication process used to remove material from a silicon wafer or other substrate using reactive gases or plasmas. It is commonly used in the semiconductor industry to create intricate patterns on integrated circuits. Unlike wet etching, dry etching is anisotropic, allowing for highly precise and directional material removal, enabling the fabrication of high-density and complex microstructures.