FIB-SEM (Focused Ion Beam - Scanning Electron Microscopy) is a powerful technique used for high-resolution imaging and nanoscale material modification. It combines the capabilities of a focused ion beam (FIB) for milling or sputtering material with the high-resolution imaging of a scanning electron microscope (SEM). This allows for precise 3D reconstruction, site-specific sample preparation for TEM, and nanoscale prototyping. It is commonly used in materials science, nanotechnology, and semiconductor industries.
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