What is FIB?

FIB most commonly refers to Focused Ion Beam. It is a technique used primarily in materials science, semiconductor manufacturing, and nanotechnology for site-specific ablation, deposition, and imaging. A focused beam of ions (typically gallium) is used to selectively remove material (sputtering), or to deposit material with the assistance of precursor gases. It is often used for TEM sample preparation, circuit editing, and failure analysis.