What is LPCVD?

LPCVD stands for Low-Pressure Chemical Vapor Deposition. It's a chemical vapor deposition process carried out at significantly reduced pressures. This lower pressure helps to improve film uniformity and reduce unwanted gas-phase reactions. It is commonly used in the semiconductor industry for depositing thin films of materials like silicon nitride, polysilicon, and silicon dioxide.

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What other technologies are related to LPCVD?

LPCVD Competitor Technologies

PECVD

PECVD (Plasma-Enhanced Chemical Vapor Deposition) is a competitor to LPCVD because both are CVD techniques used for thin film deposition, but PECVD uses plasma to enhance the chemical reaction, often allowing for lower processing temperatures than LPCVD. They compete for similar applications where temperature sensitivity is a factor.

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LPCVD Complementary Technologies

ALD

ALD (Atomic Layer Deposition) is complementary to LPCVD. While LPCVD offers higher deposition rates, ALD provides superior conformality and thickness control, especially for complex structures. They can be used together in a fabrication process to achieve desired film properties.

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Which job functions commonly mention LPCVD?

Integration Engineer

9 Integration Engineer jobs mention LPCVD

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Business Systems

10 Business Systems jobs mention LPCVD

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Facilities

36 Facilities jobs mention LPCVD

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Frontline & Manual Labor

18 Frontline & Manual Labor jobs mention LPCVD

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Engineer

103 Engineer jobs mention LPCVD

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Which organizations are mentioning LPCVD?

NXP Semiconductors

Manufacturing

ASM

Manufacturing

Analog Devices

Scientific and Technical Services

Northrop Grumman

Manufacturing

Micron Technology

Scientific and Technical Services

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**LPCVD**

What is LPCVD?

What other technologies are related to LPCVD?

LPCVD Competitor Technologies

LPCVD Complementary Technologies

Which job functions commonly mention LPCVD?

Which organizations are mentioning LPCVD?

Find the right accounts, contact, message, and time to sell

LPCVD