Inductively Coupled Plasma
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What is Inductively Coupled Plasma?
Inductively Coupled Plasma (ICP) is a type of plasma source in which energy is supplied by inductive coupling from externally generated radio frequency (RF) magnetic fields. ICPs are commonly used in analytical techniques such as ICP-OES (Optical Emission Spectrometry) and ICP-MS (Mass Spectrometry) for elemental analysis of various samples. They are also used in semiconductor manufacturing processes for etching and deposition of thin films.
What other technologies are related to Inductively Coupled Plasma?
Inductively Coupled Plasma Competitor Technologies
Capacitively Coupled Plasma
No summary available
Capacitively Coupled Plasma (CCP) is another type of plasma generation method, often used for similar applications as ICP but with different characteristics. Thus, it directly competes with ICP technology.
physical vapor deposition
Physical Vapor Deposition (PVD) is a coating process where material is vaporized then deposited. PVD is an alternative method for depositing thin films, competing with processes that utilize ICP.
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Inductively Coupled Plasma Complementary Technologies
atomic layer etching
No summary available
Atomic Layer Etching (ALE) can utilize ICP as a plasma source to perform highly controlled etching processes. ICP provides the plasma for the etching process.
plasma enhanced chemical vapor deposition
No summary available
Plasma-enhanced Chemical Vapor Deposition (PECVD) uses plasma to enhance chemical reactions in the deposition process. ICP can be used as a method of plasma generation for PECVD.
reactive ion etching
Reactive Ion Etching (RIE) is an etching technique that uses chemically reactive plasma. ICP can be used to generate the plasma for RIE.
Number of organizations that mention technology
76
Inductively Coupled Plasma
11
atomic layer etching
30
plasma enhanced chemical vapor deposition
78
reactive ion etching
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Which job functions commonly mention Inductively Coupled Plasma?
Chemist
0.1% of all Chemist jobs mention Inductively Coupled Plasma
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jobs on Sumble
Materials Engineer
0.1% of all Materials Engineer jobs mention Inductively Coupled Plasma
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Scientist
74 Scientist jobs mention Inductively Coupled Plasma
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Laboratory Services
29 Laboratory Services jobs mention Inductively Coupled Plasma
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jobs on Sumble
Engineer
98 Engineer jobs mention Inductively Coupled Plasma
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jobs on Sumble
Which organizations are mentioning Inductively Coupled Plasma?
Lam Research
Manufacturing
Oak Ridge National Laboratory
Public Administration
BASF
Manufacturing
AbbVie
Manufacturing
Sandia National Laboratories
Other Services (except Public Administration)
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