Sputtering is a physical vapor deposition (PVD) technique used to deposit thin films onto a substrate. It involves bombarding a target material (the source) with energetic ions, typically noble gas ions like argon. This bombardment causes atoms from the target to be ejected and then deposited onto the substrate, forming a thin film. Sputtering is widely used in various industries, including microelectronics, optics, and materials science, for applications such as depositing conductive layers, protective coatings, and optical films.
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