atomic layer deposition Insights

What is atomic layer deposition?

Atomic Layer Deposition (ALD) is a thin film deposition technique based on the sequential use of self-limiting gas-phase chemical reactions. It is a vapor phase technique and a subclass of chemical vapor deposition, but the process chemistry is quite different. Due to the self-limiting nature, ALD enables precise control of thickness and conformality of the deposited films, making it useful in manufacturing semiconductors, solar cells, and other nanotechnology applications.

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What other technologies are related to atomic layer deposition?

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chemical vapor deposition

CVD is a competing thin film deposition technique that can often achieve similar results to ALD, although with less precise control over layer thickness and conformality in many cases.

mentioned alongside atomic layer deposition in 51% (265) of relevant job posts

physical vapor deposition

PVD is another thin film deposition technique. While generally offering less precise control than ALD, it can be a competitor in certain applications where high conformality isn't critical.

mentioned alongside atomic layer deposition in 42% (246) of relevant job posts

plasma enhanced chemical vapor deposition

PECVD is a variation of CVD that uses plasma to enhance the deposition process. It competes with ALD in some applications but generally offers less thickness control.

What is atomic layer deposition?

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