atomic layer deposition
**atomic layer deposition**
What is atomic layer deposition?
Atomic Layer Deposition (ALD) is a thin film deposition technique based on the sequential use of self-limiting gas-phase chemical reactions. It is a vapor phase technique and a subclass of chemical vapor deposition, but the process chemistry is quite different. Due to the self-limiting nature, ALD enables precise control of thickness and conformality of the deposited films, making it useful in manufacturing semiconductors, solar cells, and other nanotechnology applications.
What other technologies are related to atomic layer deposition?
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