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plasma etch

plasma etch

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What is plasma etch?

Plasma etching is a process used in microfabrication to etch or remove material from a silicon wafer using plasma, a state of matter in which a gas becomes ionized and carries an electrical charge. It is commonly used in the production of integrated circuits and other microelectronic devices to create intricate patterns and features on the wafer surface.

What other technologies are related to plasma etch?

plasma etch Complementary Technologies

Photolithography is a crucial complementary technology to plasma etching. It defines the patterns on the wafer that are then etched using plasma etching. Without photolithography, plasma etching would not be able to create specific structures.
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