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ion implantation

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**ion implantation**

What is ion implantation?

Ion implantation is a materials engineering process in which ions of a specific element are accelerated in an electric field and smashed into a solid target, altering its physical, chemical, or electrical properties. It is widely used in semiconductor device fabrication to dope semiconductors with impurities to control their conductivity, creating p-n junctions necessary for transistors and other electronic components. It is also used to improve the surface properties of metals and ceramics.

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