ion implantation Insights

What is ion implantation?

Ion implantation is a materials engineering process in which ions of a specific element are accelerated in an electric field and smashed into a solid target, altering its physical, chemical, or electrical properties. It is widely used in semiconductor device fabrication to dope semiconductors with impurities to control their conductivity, creating p-n junctions necessary for transistors and other electronic components. It is also used to improve the surface properties of metals and ceramics.

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What other technologies are related to ion implantation?

ion implantation Competitor Technologies

Diffusion

Diffusion is an alternative method for doping semiconductors. While both diffusion and ion implantation are used to introduce impurities into a semiconductor, they are competing techniques with different advantages and disadvantages.

mentioned alongside ion implantation in 5% (52) of relevant job posts

ion implantation Complementary Technologies

photolithography

Photolithography is a crucial step in the microfabrication process that defines patterns on a substrate. Ion implantation often follows photolithography to dope specific regions defined by the patterned mask, making it complementary.

mentioned alongside ion implantation in 4% (99) of relevant job posts