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Inductively Coupled Plasma (ICP)

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**Inductively Coupled Plasma (ICP)**

What is Inductively Coupled Plasma (ICP)?

Inductively Coupled Plasma (ICP) is a type of plasma source in which energy is transferred to the gas by electromagnetic induction. It is commonly used for elemental analysis in techniques like ICP-OES (Optical Emission Spectrometry) and ICP-MS (Mass Spectrometry), as well as in etching and deposition processes in semiconductor manufacturing.

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