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Inductively Coupled Plasma (ICP)

Inductively Coupled Plasma (ICP)

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What is Inductively Coupled Plasma (ICP)?

Inductively Coupled Plasma (ICP) is a type of plasma source in which energy is transferred to the gas by electromagnetic induction. It is commonly used for elemental analysis in techniques like ICP-OES (Optical Emission Spectrometry) and ICP-MS (Mass Spectrometry), as well as in etching and deposition processes in semiconductor manufacturing.

What other technologies are related to Inductively Coupled Plasma (ICP)?

Inductively Coupled Plasma (ICP) Competitor Technologies

CCP is an alternative plasma generation method, offering different plasma characteristics compared to ICP, thus competing in some applications.
mentioned alongside Inductively Coupled Plasma (ICP) in 100% (183) of relevant job posts
RIE is another plasma etching technique that competes with ICP etching in various applications, though ICP often provides higher density plasmas.
mentioned alongside Inductively Coupled Plasma (ICP) in 87% (181) of relevant job posts

Inductively Coupled Plasma (ICP) Complementary Technologies

ALE can use ICP as a plasma source, enhancing its capabilities. It's a more controlled etching process that can be used after or in conjunction with ICP etching.
mentioned alongside Inductively Coupled Plasma (ICP) in 98% (179) of relevant job posts
PECVD can utilize ICP to enhance the deposition process. While it is a deposition technique rather than etching, it is related to the overall processing using plasma.
mentioned alongside Inductively Coupled Plasma (ICP) in 79% (156) of relevant job posts
Like PECVD, ALD is a deposition technique and can use plasma generated by ICP, thus complementary in many material processing applications.
mentioned alongside Inductively Coupled Plasma (ICP) in 62% (160) of relevant job posts

Which job functions mention Inductively Coupled Plasma (ICP)?

Job function
Jobs mentioning Inductively Coupled Plasma (ICP)
Orgs mentioning Inductively Coupled Plasma (ICP)

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